• DocumentCode
    1538610
  • Title

    Low-pressure switching plasmas with axial magnetic field stabilization

  • Author

    Römheld, Michael ; Teichmann, Jörg ; Hartmann, Werner

  • Author_Institution
    Corp. Technol., Siemens AG, Erlangen, Germany
  • Volume
    27
  • Issue
    4
  • fYear
    1999
  • fDate
    8/1/1999 12:00:00 AM
  • Firstpage
    1001
  • Lastpage
    1007
  • Abstract
    Low pressure gas discharge switches of the usual pseudospark design are known to have rather large electrode erosion rates when operated at high current levels and long switching times. In order to improve the plasma confinement and to reduce the electrode erosion in high-current applications, an axial magnetic field has been used in a low-pressure pulsed switching device. For a pulse duration of 28 μs and current amplitudes of up to 50 kA the plasma expands quickly, leading to a diffuse discharge mode. The radial expansion velocity increases with current amplitude and reaches up to 10 km/s at a peak current of 53 kA. With a further increase in current, a constricted plasma is superimposed onto the expanded diffuse part. These findings are compared with the case in which no magnetic field is applied
  • Keywords
    discharges (electric); magnetic field effects; plasma confinement; plasma pressure; plasma switches; plasma transport processes; plasma-wall interactions; 28 mus; 50 to 53 kA; axial magnetic field; axial magnetic field stabilization; constricted plasma; current amplitude; current amplitudes; diffuse discharge mode; electrode erosion; electrode erosion rates; high current levels; high-current applications; low pressure gas discharge switches; low-pressure pulsed switching device; low-pressure switching plasmas; plasma confinement; plasma radial expansion velocity; pseudospark design; pulse duration; switching times; Anodes; Cathodes; Discharges; Electrodes; Fault location; Magnetic fields; Magnetic switching; Plasma applications; Plasma confinement; Switches;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.782272
  • Filename
    782272