Vacuum-arc-generated macroparticles in the nanometer range

Author

Monteiro, Othon R. ; Anders, André

Author_Institution

Lawrence Berkeley Nat. Lab., California Univ., CA, USA

Volume

27

Issue

4

fYear

1999

fDate

8/1/1999 12:00:00 AM

Firstpage

1030

Lastpage

1033

Abstract

Micron and submicron “macroparticles” are produced along with the plasma at vacuum arc cathode spots. Published data refer to the size range 0.2-100 μm. The lower limit is determined by the resolution of the equipment used (usually scanning electron microscopes). In the present study we focus on the detection and characterization of nanosize macroparticles (“nanoparticles”) using atomic force microscopy and fieid-emission scanning electron microscopy. New information is gathered on material-dependent size distribution functions as well as on the effectiveness of magnetic filtering for nanoparticles

Keywords

atomic force microscopy; field emission electron microscopy; nanostructured materials; nanotechnology; plasma applications; scanning electron microscopy; vacuum arcs; 0.2 to 100 mum; atomic force microscopy; fieid-emission scanning electron microscopy; magnetic filtering effectiveness; material-dependent size distribution functions; micron-sized macroparticles; nanometer range; nanoparticles; nanosize macroparticles; particle size range; scanning electron microscopes; submicron-sized macroparticles; vacuum arc cathode spots; vacuum-arc-generated macroparticles; Atomic force microscopy; Cathodes; Distribution functions; Information filtering; Information filters; Magnetic separation; Nanoparticles; Plasmas; Scanning electron microscopy; Vacuum arcs;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.782276

Filename

782276