Nanosecond high current and high repetition rate electron source

Author

Gushenets, V.I. ; Koval, N.N. ; Schanin, P.M. ; Tolachev, V.S.

Author_Institution

Inst. of High-Current Electron., Acad. of Sci., Tomsk, Russia

Volume

27

Issue

4

fYear

1999

fDate

8/1/1999 12:00:00 AM

Firstpage

1055

Lastpage

1059

Abstract

A broad electron beam source with a plasma hollow cathode has been developed which is intended for production of nanosecond electron beams with a high repetition rate. The source lifetime is over 109 shots. To reduce the operating pressure and shorten the time required for the formation of plasma in the cathode cavity, an auxiliary triggering glow discharge with a hollow cathode is used. With an accelerating voltage of 40 kV a pulse repetition rate of 50-1000 Hz, and a pulse duration of 100 ns, an electron beam of current up to 200 A and risetime 25 ns has been produced

Keywords

electron beams; electron sources; glow discharges; plasma applications; 100 ns; 200 A; 25 ns; 40 kV; 50 to 1000 Hz; accelerating voltage; auxiliary triggering glow discharge; broad electron beam source; cathode cavity; current; high repetition rate electron source; nanosecond electron beams; nanosecond high current electron source; operating pressure; plasma formation; plasma hollow cathode; pulse duration; pulse repetition rate; repetition rate; risetime; source lifetime; Acceleration; Anodes; Cathodes; Electron beams; Electron sources; Fault location; Glow discharges; Plasma accelerators; Plasma properties; Plasma sources;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.782281

Filename

782281