Title :
Nanosecond high current and high repetition rate electron source
Author :
Gushenets, V.I. ; Koval, N.N. ; Schanin, P.M. ; Tolachev, V.S.
Author_Institution :
Inst. of High-Current Electron., Acad. of Sci., Tomsk, Russia
fDate :
8/1/1999 12:00:00 AM
Abstract :
A broad electron beam source with a plasma hollow cathode has been developed which is intended for production of nanosecond electron beams with a high repetition rate. The source lifetime is over 109 shots. To reduce the operating pressure and shorten the time required for the formation of plasma in the cathode cavity, an auxiliary triggering glow discharge with a hollow cathode is used. With an accelerating voltage of 40 kV a pulse repetition rate of 50-1000 Hz, and a pulse duration of 100 ns, an electron beam of current up to 200 A and risetime 25 ns has been produced
Keywords :
electron beams; electron sources; glow discharges; plasma applications; 100 ns; 200 A; 25 ns; 40 kV; 50 to 1000 Hz; accelerating voltage; auxiliary triggering glow discharge; broad electron beam source; cathode cavity; current; high repetition rate electron source; nanosecond electron beams; nanosecond high current electron source; operating pressure; plasma formation; plasma hollow cathode; pulse duration; pulse repetition rate; repetition rate; risetime; source lifetime; Acceleration; Anodes; Cathodes; Electron beams; Electron sources; Fault location; Glow discharges; Plasma accelerators; Plasma properties; Plasma sources;
Journal_Title :
Plasma Science, IEEE Transactions on
