DocumentCode :
1538711
Title :
High-current electron beam formation in an explosive emission diode at ~10-2-10
Author :
Abdullin, Eduard N. ; Bazhenov, Gennady P.
Author_Institution :
Inst. of High-Current Electron., Acad. of Sci., Tomsk, Russia
Volume :
27
Issue :
4
fYear :
1999
fDate :
8/1/1999 12:00:00 AM
Firstpage :
1092
Lastpage :
1096
Abstract :
The duration of electron beams generated in an explosive-emission diode at a ~10-2-10-1 torr gas pressure is equal to ~10-8 s and is limited by the breakdowns resulting from the filling of the interelectrode gap with plasma. The paper presents data on the production of high-current electron beams in an explosive-emission diode in the above pressure range as well as results of an investigation of the possibility to increase the beam duration. The experiments were carried out on an electron source with a high-voltage vacuum lead that prevented the initiation of a gas discharge at the nonemitting cathode regions and at the cathode holder. To slow down the decrease in diode impedance, the emitting surface of the cathodes was made of materials characterized by a low rate of plasma production. It has been shown that if the electric circuit power is high enough, the duration of the high-voltage discharge stage can be substantial. At a ~200 kV diode voltage, the discharge regimes with a high-voltage stage duration of up to 800 and 80 ns at a residual gas pressure of 10-2 and 10-1 torr, respectively, have been realized. The high-voltage stage current has been established to be completely transferred by the electron beam. This current reached ~10 2 A and higher values. The duration of the electron beam that had passed through a 50-μm thick Ti foil was ~200 and 40 ns at a 10 -2 and 10-1 torr pressure, respectively, and was limited by the foil transparency
Keywords :
beam handling techniques; discharges (electric); electron beams; electron sources; particle beam diagnostics; plasma diodes; plasma production; 10E-2 to 10E-1 torr; 10E-8 s; 10E2 A; 200 kV; 200 ns; 40 ns; 50 mum; 80 ns; 800 ns; Ti; beam duration; breakdowns; cathode holder; diode impedance; diode voltage; discharge regimes; electric circuit power; electron beam; electron beams; electron source; emitting surface; explosive emission diode; foil transparency; gas discharge; gas pressure; high-current electron beam; high-current electron beam formation; high-voltage discharge stage; high-voltage stage current; high-voltage stage duration; high-voltage vacuum; interelectrode gap; nonemitting cathode regions; plasma; plasma production; residual gas pressure; thick Ti foil; Cathodes; Diodes; Discharges; Electric breakdown; Electron beams; Electron sources; Explosives; Filling; Plasma sources; Production;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/27.782287
Filename :
782287
Link To Document :
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