Title :
Sensitivity enhancement in lateral capacitive accelerometers by structure width optimisation
Author_Institution :
Centro Nacional de Microelectronica, Seville, Spain
fDate :
2/27/1997 12:00:00 AM
Abstract :
An optimum assignment is found for the distribution of area in surface micromachined lateral capacitive accelerometers between stationary and moving electrodes to improve the S/N ratio of the sensor. Depending on etching hole geometry, the sensitivity can increase by a factor of up to 1.76
Keywords :
accelerometers; capacitance; micromachining; microsensors; optimisation; sensitivity analysis; S/N ratio; SNR improvement; area distribution; etching hole geometry; lateral capacitive accelerometers; micromachined accelerometers; moving electrodes; optimum assignment; sensitivity enhancement; stationary electrodes; structure width optimisation;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19970256
