• DocumentCode
    1538809
  • Title

    Characterization of a linear venetian-blind macroparticle filter for cathodic vacuum arcs

  • Author

    Bilek, Marcela M.M. ; Anders, André ; Brown, Ian G.

  • Author_Institution
    Dept. of Eng., Cambridge Univ., UK
  • Volume
    27
  • Issue
    4
  • fYear
    1999
  • fDate
    8/1/1999 12:00:00 AM
  • Firstpage
    1197
  • Lastpage
    1202
  • Abstract
    The cathodic vacuum are is a simple means of creating a highly ionized metal or carbon plasma, which can be used to produce a wide variety of metal and metal compound thin films. In order to produce smooth, defect-free films suitable for optical and electronic applications, the plasma needs to be filtered of micrometer-sized molten and solid cathode debris known as macroparticles. To date, most of the research effort on plasma filtering has been focused on development and optimization of magnetic filter designs based on curved solenoids. Ryabchikov et al. (1998) proposed and employed novel filter designs for a combined plasma and ion beam source. The new designs are based on a nested set of conical plates in one version and a set of angled plates (“venetian blind”) in another. We report on a detailed characterization of the operation of a filter employing a linear venetian blind geometry. The effects of parameters such as plate and arc currents, as well as plate bias on the throughput and deposition profile are reported
  • Keywords
    cathodes; filters; plasma deposition; plasma impurities; plasma transport processes; vacuum arcs; C; angled plates; arc currents; cathodic vacuum arcs; conical plates; curved solenoids; defect-free films; deposition profile; development; electronic applications; filter designs; highly ionized C plasma; highly ionized metal plasma; ion beam source; linear venetian blind geometry; linear venetian-blind macroparticle filter; macroparticles; magnetic filter designs; metal compound thin films; metal thin films; micrometer-sized molten cathode debris; micrometer-sized solid cathode debris; optical applications; optimization; plasma filtering; plasma source; plate bias; Carbon compounds; Magnetic films; Magnetic separation; Nonlinear filters; Optical films; Optical filters; Plasma applications; Plasma sources; Solids; Transistors;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.782300
  • Filename
    782300