DocumentCode
1538815
Title
Influence of sample placement on the dose uniformity in plasma immersion ion implantation of industrial ball bearings
Author
Zeng, Zhaoming ; Tian, Xiubo ; Kwok, Dixon Tat-Kun ; Tang, Baoyin ; Chu, Paul K.
Author_Institution
Dept. of Phys. & Mater. Sci., City Univ. of Hong Kong, Kowloon, China
Volume
27
Issue
4
fYear
1999
fDate
8/1/1999 12:00:00 AM
Firstpage
1203
Lastpage
1209
Abstract
Plasma immersion ion implantation (PIII) is an effective technique to enhance the surface properties of industrial components possessing an irregular shape. However, it is difficult to achieve uniform implantation along the groove surface of a ball bearing. In this work, we focus on the PIII treatment of the arc surface of an industrial ball bearing. Three practical sample placement configurations are investigated: I) direct placement on the sample stage platen, II) placement on a copper extension with the same diameter as the bearing race, III) placement on a copper plate erected on the sample stage by means of a small metal rod. Using theoretical simulation, the implant dose uniformity along the groove surface is determined for the three orientations. Our results reveal that configuration III) yields the largest implant dose along the groove surface and the dose uniformity is worse in configuration I). Hence, in order to improve the lateral dose uniformity along the race surface, the bearing should be elevated from the sample
Keywords
ion implantation; machine bearings; plasma materials processing; plasma-wall interactions; arc surface; copper extension; copper plate; direct placement; dose uniformity; duty cycle; glancing ion incidence; groove surface; implant dose; industrial ball bearings; ion-matrix sheath; irregular shape; metal rod; modulator; plasma immersion ion implantation; plasma sheath simulation; potential distribution; power supply; sample chuck; sample placement; surface properties; two-dimensional fluid model; Ball bearings; Copper; Implants; Ion implantation; Materials science and technology; Physics; Plasma immersion ion implantation; Shape; Surface treatment; Voltage;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.782301
Filename
782301
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