DocumentCode :
1539181
Title :
AlGaAs/GaAs surface emitting laser diode with curved reflector
Author :
Lee, Seung-Chul
Volume :
26
Issue :
18
fYear :
1990
Firstpage :
1506
Lastpage :
1508
Abstract :
An AlGaAs/GaAs surface-emitting laser diode using one step liquid phase epitaxial growth has been successfully fabricated. A micro-cleavage technique was developed to fabricate the mirrors of the laser cavity. The laser beam emitted horizontally from the edge of the laser cavity is converted to the vertical direction using a nearby slant metal reflector formed by pregrowth selective etching of the substrate and subsequent liquid phase epitaxial growth. The maximum power output is beyond 10 mW and the threshold current density achieved is 8 kA/cm2. The full width at half maximum of the far field pattern perpendicular to the laser bar is 9 degrees .
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; liquid phase epitaxial growth; semiconductor junction lasers; semiconductor technology; 10 mW; AlGaAs-GaAs; III-V semiconductors; laser cavity; micro-cleavage; mirrors; one step liquid phase epitaxial growth; pregrowth selective etching; semiconductor laser; slant metal reflector; surface emitting laser diode; threshold current density; vertical direction;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19900967
Filename :
58121
Link To Document :
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