Title :
Stitching-error reduction in gratings by shot-shifted electron-beam lithography
Author :
Dougherty, David J. ; Muller, Richard E. ; Maker, Paul D. ; Forouhar, Siamak
Author_Institution :
Scion Photonics, Milpitas, CA, USA
fDate :
10/1/2001 12:00:00 AM
Abstract :
Calculations of the grating spatial-frequency spectrum and the filtering properties of multiple-pass electron-beam writing demonstrate a tradeoff between stitching-error suppression and minimum pitch separation. High-resolution measurements of optical-diffraction patterns show a 25-dB reduction in stitching-error side modes
Keywords :
diffraction gratings; electron beam lithography; integrated optics; filtering properties; grating spatial-frequency spectrum; gratings; high-resolution measurements; minimum pitch separation; multiple-pass electron-beam writing; optical-diffraction patterns; shot-shifted electron-beam lithography; stitching-error reduction; stitching-error side modes; stitching-error suppression; Distributed feedback devices; Gratings; Laboratories; Laser feedback; Laser modes; Lithography; Optical feedback; Optical filters; Semiconductor lasers; Writing;
Journal_Title :
Lightwave Technology, Journal of
