S-N-S weaklink junctions fabricated by nanometer lithography

Author

Hirose, N. ; Ohta, H. ; Matsui, T. ; Fukuda, M.

Author_Institution

Commun. Res. Lab., Minist. of Posts & Telecommun., Tokyo, Japan

Volume

7

Issue

2

fYear

1997

fDate

6/1/1997 12:00:00 AM

Firstpage

2635

Lastpage

2637

Abstract

It is well known that the dimensions of the weak-link is the most important factor of its characteristics. However, the relationship between the dimensions and the characteristics of the weak-links are not clarified, because the geometrical dimensions are usually different from the effective dimensions, To clarify this relationship, we fabricated S-N-S (niobium as the superconductor and gold as the normal metal) weak-link junctions using electron beam lithography (EBL), reactive ion etching (RIE) and lift-off. The dimensions of the weak-links were controllable and the minimum width and length were 30 nm and 40 nm, respectively,.

Keywords

Josephson effect; electron beam lithography; gold; niobium; sputter etching; superconducting junction devices; type II superconductors; 30 nm; 40 nm; Josephson junctions; Nb-Au-Nb; S-N-S weaklink junctions; electron beam lithography; geometrical dimensions; lift-off; nanometer lithography; reactive ion etching; Chromium; Electron beams; Etching; Fabrication; Gold; Josephson junctions; Lithography; Niobium; Sputtering; Substrates;

fLanguage

English

Journal_Title

Applied Superconductivity, IEEE Transactions on

Publisher

ieee

ISSN

1051-8223

Type

jour

DOI

10.1109/77.621780

Filename

621780