Title :
Low phonon energy, Nd:LaF3 channel waveguide lasers fabricated by molecular beam epitaxy
Author :
Bhutta, T. ; Chardon, A.M. ; Shepherd, D.P. ; Daran, E. ; Serrano, C. ; Munoz-Yagüe, A.
Author_Institution :
Optoelectron. Res. Centre, Southampton Univ., UK
fDate :
11/1/2001 12:00:00 AM
Abstract :
We report the first fabrication and laser operation of channel waveguides based on LaF3 planar thin films grown by molecular beam epitaxy. To our knowledge, this is the lowest phonon energy dielectric material to have shown guided-wave laser operation to date. A full characterization, in terms of spectroscopy, laser results, and propagation losses, is given for the planar thin films upon which the channel waveguides are based. Two channel-fabrication methods are then described, the first involves ion milling and the second takes the novel approach of using a photo-definable polymer overlay. Laser operation in Nd-doped samples is demonstrated at 1.06, 1.05, and 1.3 μm, and the potential for mid-infrared laser sources based on such guides is discussed
Keywords :
infrared sources; lanthanum compounds; laser transitions; molecular beam epitaxial growth; neodymium; optical fabrication; optical losses; phonons; solid lasers; waveguide lasers; 1.05 mum; 1.06 mum; 1.3 mum; LaF3 planar thin films; LaF3:Nd; Nd-doped samples; Nd:LaF3 channel waveguide lasers; channel-fabrication methods; guided-wave laser operation; low phonon energy; lowest phonon energy dielectric material; mid-infrared laser sources; molecular beam epitaxy; optical fabrication; photo-definable polymer overlay; propagation losses; spectroscopy; Dielectric materials; Dielectric thin films; Molecular beam epitaxial growth; Optical device fabrication; Phonons; Planar waveguides; Polymer films; Propagation losses; Spectroscopy; Waveguide lasers;
Journal_Title :
Quantum Electronics, IEEE Journal of