DocumentCode :
1542495
Title :
Interface-engineered YBCO edge junctions
Author :
Moeckly, B.H. ; Char, K. ; Huang, Yi. ; Merkie, K.L.
Author_Institution :
Conductus Inc., Sunnyvale, CA, USA
Volume :
9
Issue :
2
fYear :
1999
fDate :
6/1/1999 12:00:00 AM
Firstpage :
3358
Lastpage :
3361
Abstract :
We have fabricated all YBCO edge junctions which do not require the deposition of an interlayer or barrier material. Rather, through appropriate high-temperature vacuum annealing and in-situ ion plasma treatments, we have modified the junction interface in such a way as to lead to reliable weak link behavior. These devices display RSJ-type I-V characteristics with excellent magnetic field modulation. I/sub c/R/sub n/ values over the range 0.5 to 3 mV and corresponding R/sub n/A values of 6/spl times/10/sup -8/ to 1.2/spl times/10/sup -9/ /spl Omega/-cm/sup 2/ at 20 K are easily attained by varying the process, which is not possible in most high-T/sub c/ junction technologies. These junctions can also be very uniform and appear to be quite stable. We have observed an unusual response to applied microwave radiation. We have investigated the microstructure of these junctions using transmission electron microscopy (TEM). Results of these analyses lead us to believe these junctions are feasible as the basic components of a high-T/sub c/ circuit technology.
Keywords :
Josephson effect; annealing; barium compounds; high-temperature superconductors; plasma materials processing; superconducting junction devices; superconducting microwave devices; transmission electron microscopy; yttrium compounds; 0.5 to 3 mV; 20 K; RSJ-type I-V characteristics; YBaCuO; applied microwave radiation; high-T/sub c/ junction technologies; high-temperature vacuum annealing; in-situ ion plasma treatments; interface-engineered edge junctions; junction interface; magnetic field modulation; transmission electron microscopy; weak link behavior; Annealing; Magnetic fields; Magnetic materials; Magnetic modulators; Microstructure; Plasma devices; Plasma displays; Plasma materials processing; Plasma properties; Yttrium barium copper oxide;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/77.783749
Filename :
783749
Link To Document :
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