• DocumentCode
    1542627
  • Title

    Preparation of ramp-edge Josephson junctions with natural barriers

  • Author

    Fujimaki, A. ; Kawai, K. ; Hayashi, N. ; Horibe, M. ; Maruyama, M. ; Hayakawa, H.

  • Author_Institution
    Dept. of Quantum Eng., Nagoya Univ., Japan
  • Volume
    9
  • Issue
    2
  • fYear
    1999
  • fDate
    6/1/1999 12:00:00 AM
  • Firstpage
    3436
  • Lastpage
    3439
  • Abstract
    We have demonstrated ramp-edge Josephson junctions using high temperature superconductors without depositing artificial barriers. We use a surface barrier formed naturally during an etching process by an Ar ion beam. The resistivity of the barrier, which is evaluated in the Nb/Au/YBCO structures, changes over 4 orders in accordance with the gas pressure in the vacuum annealing executed before the deposition of the counter-electrode. All the junctions having YBCO/barrier/YBCO structure exhibit RSJ-like current-voltage characteristics over the entire temperature range of operation. Fraunhofer-like modulation patterns are observed with a very small amount of excess current even at low temperatures except for large junctions. The temperature dependence of J/sub c/ and R/sub u/A are similar to those in HTS grain boundary junctions. Since the junction parameters are controlled by the total pressure during the vacuum annealing, the junctions made through this procedure have a potential for circuit applications.
  • Keywords
    Josephson effect; annealing; barium compounds; high-temperature superconductors; sputter etching; yttrium compounds; Ar ion beam etching; Fraunhofer modulation pattern; Nb-Au-YBaCuO; RSJ model; current-voltage characteristics; electrical resistivity; high temperature superconductor; ramp-edge Josephson junction; surface barrier; vacuum annealing; Annealing; Argon; Conductivity; Etching; Gold; High temperature superconductors; Ion beams; Josephson junctions; Niobium; Yttrium barium copper oxide;
  • fLanguage
    English
  • Journal_Title
    Applied Superconductivity, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1051-8223
  • Type

    jour

  • DOI
    10.1109/77.783768
  • Filename
    783768