• DocumentCode
    154273
  • Title

    Ultra-broadband chip-to-chip interconnects to 220 GHz for Si-based millimeter-wave systems

  • Author

    Kopp, David P. ; Khan, Mohammad A. A. ; Bernstein, Gary H. ; Fay, Patrick

  • Author_Institution
    Dept. of Electr. Eng., Univ. of Notre Dame, Notre Dame, IN, USA
  • fYear
    2014
  • fDate
    20-23 May 2014
  • Firstpage
    293
  • Lastpage
    296
  • Abstract
    Ultra-broadband chip-to-chip interconnects at high frequencies are demonstrated. These interconnects, based on the Quilt Packaging (QP) approach, appear to be promising for applications in millimeter-wave circuits due to their extremely wide bandwidth and ease of assembly. The performance of chip-to-chip interconnects in a 50 Ω coplanar waveguide environment on high-resistivity silicon substrates has been measured to 220 GHz using a vector network analyzer, and is compared with projections obtained from 3D electromagnetic modeling. Single-mode, resonance-free operation is demonstrated through 220 GHz, with insertion loss below 1.5 dB over the full frequency range. Although the resistance of the conductive epoxy (used for the prototypes reported here) limits the performance of the QP nodules, simulations indicate that better joining methods such as soldering promise to yield insertion loss of much less than 1 dB at 220 GHz.
  • Keywords
    coplanar waveguides; elemental semiconductors; integrated circuit interconnections; integrated circuit packaging; millimetre wave integrated circuits; network analysers; silicon; soldering; 3D electromagnetic modeling; Si; conductive epoxy; coplanar waveguide; frequency 220 GHz; millimeter wave systems; quilt packaging; resistance 50 ohm; soldering; ultra-broadband chip-to-chip interconnects; vector network analyzer; Electrical resistance measurement; Frequency measurement; Insertion loss; Integrated circuit interconnections; Loss measurement; Packaging; Resistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC), 2014 IEEE International
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-4799-5016-4
  • Type

    conf

  • DOI
    10.1109/IITC.2014.6831883
  • Filename
    6831883