DocumentCode :
154273
Title :
Ultra-broadband chip-to-chip interconnects to 220 GHz for Si-based millimeter-wave systems
Author :
Kopp, David P. ; Khan, Mohammad A. A. ; Bernstein, Gary H. ; Fay, Patrick
Author_Institution :
Dept. of Electr. Eng., Univ. of Notre Dame, Notre Dame, IN, USA
fYear :
2014
fDate :
20-23 May 2014
Firstpage :
293
Lastpage :
296
Abstract :
Ultra-broadband chip-to-chip interconnects at high frequencies are demonstrated. These interconnects, based on the Quilt Packaging (QP) approach, appear to be promising for applications in millimeter-wave circuits due to their extremely wide bandwidth and ease of assembly. The performance of chip-to-chip interconnects in a 50 Ω coplanar waveguide environment on high-resistivity silicon substrates has been measured to 220 GHz using a vector network analyzer, and is compared with projections obtained from 3D electromagnetic modeling. Single-mode, resonance-free operation is demonstrated through 220 GHz, with insertion loss below 1.5 dB over the full frequency range. Although the resistance of the conductive epoxy (used for the prototypes reported here) limits the performance of the QP nodules, simulations indicate that better joining methods such as soldering promise to yield insertion loss of much less than 1 dB at 220 GHz.
Keywords :
coplanar waveguides; elemental semiconductors; integrated circuit interconnections; integrated circuit packaging; millimetre wave integrated circuits; network analysers; silicon; soldering; 3D electromagnetic modeling; Si; conductive epoxy; coplanar waveguide; frequency 220 GHz; millimeter wave systems; quilt packaging; resistance 50 ohm; soldering; ultra-broadband chip-to-chip interconnects; vector network analyzer; Electrical resistance measurement; Frequency measurement; Insertion loss; Integrated circuit interconnections; Loss measurement; Packaging; Resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC), 2014 IEEE International
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4799-5016-4
Type :
conf
DOI :
10.1109/IITC.2014.6831883
Filename :
6831883
Link To Document :
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