Title :
Enhanced output power in an InGaN-GaN multiquantum-well light-emitting diode with an InGaN current-spreading layer
Author :
Sheu, J.K. ; Chi, G.C. ; Jou, M.J.
Author_Institution :
Opt. Sci. Center, Nat. Central Univ., Chung-Li, Taiwan
Abstract :
InGaN-GaN multiple quantum-well (MQW) light-emitting diodes (LEDs) with InGaN current-spreading layer were grown by metal-organic vapor-phase epitaxy (MOVPE) and their characteristics were evaluated by current-voltage (I-V), as well as output power measurements. Experimental results indicate that the LEDs exhibited a higher output power and a lower operation voltage than that of conventional LEDs. The external quantum efficiency of InGaN-GaN MQW LEDs for bare chips operated at injection current of 20 mA with InGaN current spreading layer near 5%. This is two times higher than that of conventional LEDs. This could be tentatively attributed to the better current-spreading effect resulting from Si-doped In/sub 0.18/Ga/sub 0.82/N wide potential well in which electron states are not quantized.
Keywords :
III-V semiconductors; MOCVD; gallium compounds; indium compounds; light emitting diodes; semiconductor quantum wells; vapour phase epitaxial growth; 5 percent; In/sub 0.18/Ga/sub 0.82/N:Si; In/sub 0.18/Ga/sub 0.82/N:Si wide potential well; InGaN current spreading layer; InGaN current-spreading layer; InGaN-GaN; InGaN-GaN MQW LEDs; InGaN-GaN multiquantum-well light-emitting diode; MOVPE; Si-doped In/sub 0.18/Ga/sub 0.82/N wide potential well; bare chips; current-voltage; electron states; enhanced output power; external quantum efficiency; injection current; lower operation voltage; metal-organic vapor-phase epitaxy; output power measurements; Current measurement; Epitaxial growth; Epitaxial layers; Light emitting diodes; Potential well; Power generation; Power measurement; Quantum well devices; Semiconductor device measurement; Voltage;
Journal_Title :
Photonics Technology Letters, IEEE