DocumentCode :
1543709
Title :
Excimer laser ablation and etching
Author :
Brannon, James
Author_Institution :
IBM Almaden Res. Center, San Jose, CA, USA
Volume :
13
Issue :
2
fYear :
1997
fDate :
3/1/1997 12:00:00 AM
Firstpage :
11
Lastpage :
18
Abstract :
Today, excimer laser ablation and etching techniques have found use in applications ranging from semiconductor processing to correcting human vision problems. This article discusses these techniques, as well as some relevant engineering issues. The progress of excimer lasers in patterning technology is briefly presented, and the article concludes by discussing several applications of ablation and etching that have high potential industrial use and significance
Keywords :
etching; excimer lasers; laser ablation; laser beam etching; laser materials processing; excimer laser ablation; excimer laser etching; human vision correction; industrial applications; patterning technology; semiconductor processing; Etching; Gas lasers; Laser ablation; Laser beam cutting; Optical materials; Optical pulses; Pulsed laser deposition; Semiconductor lasers; Solid lasers; Surface emitting lasers;
fLanguage :
English
Journal_Title :
Circuits and Devices Magazine, IEEE
Publisher :
ieee
ISSN :
8755-3996
Type :
jour
DOI :
10.1109/101.583607
Filename :
583607
Link To Document :
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