• DocumentCode
    1543709
  • Title

    Excimer laser ablation and etching

  • Author

    Brannon, James

  • Author_Institution
    IBM Almaden Res. Center, San Jose, CA, USA
  • Volume
    13
  • Issue
    2
  • fYear
    1997
  • fDate
    3/1/1997 12:00:00 AM
  • Firstpage
    11
  • Lastpage
    18
  • Abstract
    Today, excimer laser ablation and etching techniques have found use in applications ranging from semiconductor processing to correcting human vision problems. This article discusses these techniques, as well as some relevant engineering issues. The progress of excimer lasers in patterning technology is briefly presented, and the article concludes by discussing several applications of ablation and etching that have high potential industrial use and significance
  • Keywords
    etching; excimer lasers; laser ablation; laser beam etching; laser materials processing; excimer laser ablation; excimer laser etching; human vision correction; industrial applications; patterning technology; semiconductor processing; Etching; Gas lasers; Laser ablation; Laser beam cutting; Optical materials; Optical pulses; Pulsed laser deposition; Semiconductor lasers; Solid lasers; Surface emitting lasers;
  • fLanguage
    English
  • Journal_Title
    Circuits and Devices Magazine, IEEE
  • Publisher
    ieee
  • ISSN
    8755-3996
  • Type

    jour

  • DOI
    10.1109/101.583607
  • Filename
    583607