• DocumentCode
    1544250
  • Title

    Fabrication of niobium-carbonitride Josephson junctions on magnesium-oxide substrates using chemical-mechanical polishing

  • Author

    Kohjiro, S. ; Yamamori, H. ; Shoji, A.

  • Author_Institution
    Electrotech. Lab., Tsukuba, Japan
  • Volume
    9
  • Issue
    2
  • fYear
    1999
  • fDate
    6/1/1999 12:00:00 AM
  • Firstpage
    4464
  • Lastpage
    4466
  • Abstract
    We have developed a fabrication technique for narrow NbC/sub x/N/sub 1-x//MgO/NbC/sub x/N/sub 1-x/ junctions on MgO substrates using chemical-mechanical polishing (CMP) for the removal of SiO/sub 2/ insulation layer from the top of junctions. Parameters of CMP have been optimized so that the run-to-run deviation of removal rate for SiO/sup 2/ is less than /spl plusmn/20% and uniformity across a 10 mm/spl times/10 mm area is better than /spl plusmn/20%. Using the optimized CMP, NbC/sub x/N/sub 1-x//MgO/NbC/sub x/N/sub 1-x/ junctions with width of 1-4 /spl mu/m have been successfully fabricated. Fabricated junctions showed no superconducting leakage current and critical current densities of interconnections between the counter electrode and the wiring were larger than 1/spl times/10/sup 8/ A/m/sup 2/. This CMP-based fabrication technique is applicable to SIS mixers and Josephson local oscillators operated near 1 THz.
  • Keywords
    Josephson effect; chemical mechanical polishing; niobium compounds; Josephson local oscillator; MgO; NbCN-MgO-NbCN; SIS mixer; SiO/sub 2/ insulation layer removal; chemical-mechanical polishing; critical current density; fabrication; magnesium oxide substrate; niobium carbonitride Josephson junction; superconducting leakage current; Chemicals; Counting circuits; Critical current density; Electrodes; Fabrication; Insulation; Josephson junctions; Leakage current; Niobium compounds; Superconducting devices;
  • fLanguage
    English
  • Journal_Title
    Applied Superconductivity, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1051-8223
  • Type

    jour

  • DOI
    10.1109/77.784016
  • Filename
    784016