DocumentCode :
1545381
Title :
Microfabrication of oxidation-sharpened silicon tips on silicon nitride cantilevers for atomic force microscopy
Author :
Folch, Albert ; Wrighton, Mark S. ; Schmidt, Martin A.
Author_Institution :
Dept. of Chem., MIT, Cambridge, MA, USA
Volume :
6
Issue :
4
fYear :
1997
fDate :
12/1/1997 12:00:00 AM
Firstpage :
303
Lastpage :
306
Abstract :
We have developed a novel process for the microfabrication of atomic force microscope (AFM) cantilevered tips from silicon-on-insulator (SOI) wafers. The tip and cantilever are made of crystalline silicon and low-stress silicon nitride, respectively. This choice of materials allows us to sharpen the tips by oxidation sharpening without affecting the cantilever. We evaluated their performance in contact mode during imaging of artificial nanostructures and compared them to commercially available ones. The images acquired with our tips feature superior resolution on those samples
Keywords :
atomic force microscopy; elemental semiconductors; micromachining; microsensors; oxidation; semiconductor technology; silicon; silicon-on-insulator; AFM cantilevers; SOI wafers; Si; Si-Si3N4; atomic force microscopy; contact mode; crystalline Si; microfabrication; oxidation-sharpened Si tips; resolution; silicon nitride cantilevers; Atomic force microscopy; Chemical technology; Chemistry; Crystalline materials; Crystallization; Laboratories; Nanostructured materials; Oxidation; Silicon on insulator technology; Surface topography;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/84.650126
Filename :
650126
Link To Document :
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