DocumentCode
1546019
Title
Generation-recombination noise in the near fully depleted SIMOX N-MOSFET operating in the linear region
Author
Ang, D.S. ; Lun, Z. ; Ling, C.H.
Author_Institution
Fac. of Eng., Nat. Univ. of Singapore, Singapore
Volume
22
Issue
11
fYear
2001
Firstpage
545
Lastpage
547
Abstract
Noise measurements in the linear region of the device characteristics of a SIMOX N-MOSFET show the evolution of an important low-frequency Lorentzian-like noise, during the transition from fully depleted to near fully depleted or partially depleted operation. In the kink region, the same low-frequency noise component co-exists with the high-frequency Lorentzian-like noise due to impact ionization. For this low-frequency noise component, a generation-recombination origin is proposed and supported with experimental evidence that indicates the involvement of deep-level bulk traps, possibly related to oxygen impurities, in the depleted silicon film.
Keywords
MOSFET; SIMOX; deep levels; impact ionisation; semiconductor device noise; current noise spectra; deep-level bulk traps; depleted silicon film; generation-recombination noise; high-frequency Lorentzian-like noise; impact ionization; kink region; linear region operation; low-frequency Lorentzian-like noise; near fully depleted SIMOX N-MOSFET; oxygen impurities; partially depleted operation; Impact ionization; Impedance; Impurities; Low-frequency noise; MOSFET circuits; Noise generators; Noise measurement; Semiconductor films; Silicon; Voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/55.962658
Filename
962658
Link To Document