Title :
Generation-recombination noise in the near fully depleted SIMOX N-MOSFET operating in the linear region
Author :
Ang, D.S. ; Lun, Z. ; Ling, C.H.
Author_Institution :
Fac. of Eng., Nat. Univ. of Singapore, Singapore
Abstract :
Noise measurements in the linear region of the device characteristics of a SIMOX N-MOSFET show the evolution of an important low-frequency Lorentzian-like noise, during the transition from fully depleted to near fully depleted or partially depleted operation. In the kink region, the same low-frequency noise component co-exists with the high-frequency Lorentzian-like noise due to impact ionization. For this low-frequency noise component, a generation-recombination origin is proposed and supported with experimental evidence that indicates the involvement of deep-level bulk traps, possibly related to oxygen impurities, in the depleted silicon film.
Keywords :
MOSFET; SIMOX; deep levels; impact ionisation; semiconductor device noise; current noise spectra; deep-level bulk traps; depleted silicon film; generation-recombination noise; high-frequency Lorentzian-like noise; impact ionization; kink region; linear region operation; low-frequency Lorentzian-like noise; near fully depleted SIMOX N-MOSFET; oxygen impurities; partially depleted operation; Impact ionization; Impedance; Impurities; Low-frequency noise; MOSFET circuits; Noise generators; Noise measurement; Semiconductor films; Silicon; Voltage;
Journal_Title :
Electron Device Letters, IEEE