• DocumentCode
    1546019
  • Title

    Generation-recombination noise in the near fully depleted SIMOX N-MOSFET operating in the linear region

  • Author

    Ang, D.S. ; Lun, Z. ; Ling, C.H.

  • Author_Institution
    Fac. of Eng., Nat. Univ. of Singapore, Singapore
  • Volume
    22
  • Issue
    11
  • fYear
    2001
  • Firstpage
    545
  • Lastpage
    547
  • Abstract
    Noise measurements in the linear region of the device characteristics of a SIMOX N-MOSFET show the evolution of an important low-frequency Lorentzian-like noise, during the transition from fully depleted to near fully depleted or partially depleted operation. In the kink region, the same low-frequency noise component co-exists with the high-frequency Lorentzian-like noise due to impact ionization. For this low-frequency noise component, a generation-recombination origin is proposed and supported with experimental evidence that indicates the involvement of deep-level bulk traps, possibly related to oxygen impurities, in the depleted silicon film.
  • Keywords
    MOSFET; SIMOX; deep levels; impact ionisation; semiconductor device noise; current noise spectra; deep-level bulk traps; depleted silicon film; generation-recombination noise; high-frequency Lorentzian-like noise; impact ionization; kink region; linear region operation; low-frequency Lorentzian-like noise; near fully depleted SIMOX N-MOSFET; oxygen impurities; partially depleted operation; Impact ionization; Impedance; Impurities; Low-frequency noise; MOSFET circuits; Noise generators; Noise measurement; Semiconductor films; Silicon; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.962658
  • Filename
    962658