DocumentCode
1546775
Title
I2L: Coexistence with NMOS
Author
Verhofstadt, P.
Author_Institution
Fairchild Semiconductor, Mountain View, CA, USA
Volume
14
Issue
6
fYear
1977
fDate
6/1/1977 12:00:00 AM
Firstpage
33
Lastpage
34
Abstract
Fairchild has applied dielectric-isolation techniques to I2L and come up with a speed- and density-enhancing version called Isoplanar integrated-injection logic, or I3L. This paper describes this latest development and compares it to the traditional I2L.
Keywords
integrated logic circuits; dielectric isolation technique; isoplanar integrated injection logic circuit;
fLanguage
English
Journal_Title
Spectrum, IEEE
Publisher
ieee
ISSN
0018-9235
Type
jour
DOI
10.1109/MSPEC.1977.6501494
Filename
6501494
Link To Document