DocumentCode
1546842
Title
Demonstration of efficient p-type doping in Al/sub x/Ga/sub 1-x/N/GaN superlattice structures
Author
Goepfert, I.D. ; Schubert, E.F. ; Osinsky, A. ; Norris, P.E.
Author_Institution
Dept. of Electr. & Comput. Eng., Boston Univ., MA, USA
Volume
35
Issue
13
fYear
1999
fDate
6/24/1999 12:00:00 AM
Firstpage
1109
Lastpage
1111
Abstract
Enhanced acceptor activation, reduced acceptor binding energy and enhanced conductivity are demonstrated in Al/sub x/Ga/sub 1-x/N/GaN doped superlattice structures. An acceptor activation energy of 58 meV is demonstrated in an Al/sub 0.20/Ga/sub 0.80/N/GaN superlattice structure with a period of 200 /spl Aring/. This value is significantly lower than the 200 meV activation energy measured in bulk GaN. The dependence of activation energy on the Al content of the superlattice is consistent with that predicted by the theoretical model. The demonstration of improved p-type doping characteristics in GaN is expected to enable the realisation of electronic and optoelectronic devices with improved properties.
Keywords
semiconductor doping; 58 meV; AlGaN-GaN; III-V semiconductors; acceptor activation; acceptor binding energy; conductivity; optoelectronic devices; p-type doping characteristics; superlattice structures;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19990758
Filename
784559
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