• DocumentCode
    1546926
  • Title

    Fabrication of second-order gratings for 1.55 μm DFB lasers using deep UV lithography

  • Author

    Goarin, E. ; Louis, Y. ; Sainson, S.

  • Author_Institution
    Lab. de Marcoussis, CR-CGE, Marcoussis
  • Volume
    24
  • Issue
    2
  • fYear
    1988
  • fDate
    1/21/1988 12:00:00 AM
  • Firstpage
    81
  • Lastpage
    83
  • Abstract
    Second-order gratings for 1.55 μm DFB lasers have been fabricated on InP substrate using contact deep UV (220 nm) lithography. Localised gratings with a 0.48 μm pitch were clearly resolved in PMMA photoresist and then transferred in InP by wet chemical etching
  • Keywords
    diffraction gratings; distributed feedback lasers; integrated optics; laser transitions; optical workshop techniques; photolithography; semiconductor junction lasers; 0.48 micron; 1.55 micron; 220 nm; DFB lasers; InP substrate; PMMA photoresist; contact type; deep UV lithography; second-order gratings; semiconductor lasers; submicron pitch; wet chemical etching;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • Filename
    5519
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1546926