DocumentCode :
1547511
Title :
The gate bias and geometry dependence of random telegraph signal amplitudes [MOSFET]
Author :
Martin, Scott T. ; Li, G.P. ; Worley, Eugene ; White, Joe
Author_Institution :
Dept. of Electr. & Comput. Eng., California Univ., Irvine, CA, USA
Volume :
18
Issue :
9
fYear :
1997
Firstpage :
444
Lastpage :
446
Abstract :
A new random telegraph signal (RTS) amplitude model based upon band bending fluctuations has been developed, in contrast to other studies of RTS noise amplitudes, which are derived from RTS fitting parameters, it is demonstrated in this work that noise amplitudes may be predicted from band bending calculations and device DC characteristics. This new model suggests that the decrease in band bending associated with slow-state trapping results in mobility degradation for low gate biases (Coulombic-scattering-limited) and an enhancement in mobility due to vertical field reductions at high gate biases (surface roughness/phonon scattering limited). The band bending formulation shows good correlation with experimental data and accurately predicts the observed dependence upon effective channel length and width.
Keywords :
MOSFET; band structure; carrier mobility; fluctuations; semiconductor device models; semiconductor device noise; Coulombic-scattering-limited; RTS noise amplitudes; band bending fluctuations; device DC characteristics; effective channel length; effective channel width; gate bias dependence; geometry dependence; mobility degradation; model; random telegraph signal amplitudes; slow-state trapping; submicron gate MOSFET; vertical field reductions; Degradation; Fluctuations; Geometry; Noise level; Phonons; Predictive models; Rough surfaces; Scattering; Surface roughness; Telegraphy;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.622524
Filename :
622524
Link To Document :
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