• DocumentCode
    1548101
  • Title

    Noise parameter modeling for InP-based pseudomorphic HEMTs [InAlAs-InGaAs]

  • Author

    Ando, Yuji ; Cappy, Alain ; Marubashi, K. ; Onda, Kazuhiko ; Miyamoto, Hironobu ; Kuzuhara, Masaaki

  • Author_Institution
    Kansai Electron. Res. Labs., NEC Corp., Ohtsu, Japan
  • Volume
    44
  • Issue
    9
  • fYear
    1997
  • fDate
    9/1/1997 12:00:00 AM
  • Firstpage
    1367
  • Lastpage
    1374
  • Abstract
    The effect of electron mobility (μn) on noise properties for InP-based pseudomorphic HEMTs has been analyzed based on the impedance field model. The analysis predicts that increasing μ n improves the minimum noise figure (Fmin) and associated gain not only because the unity current gain cut-off frequency increases but also because the source resistance is reduced. The analysis also predicts that increasing μn reduces the input noise resistance due to higher transconductance but hardly influences the noise-optimum impedance. Furthermore, it is predicted that the decrease in Fmin with increasing μn becomes less significant above 11000 cm2/Vs due to larger diffusion noise. Calculated results compare well with the measured scattering and noise parameters for InxGa1-xAs(x=0.53, 0.7, and 0.8) channel devices. Similar dependence of noise parameters on μn is shown in the theoretical and experimental results
  • Keywords
    III-V semiconductors; aluminium compounds; electron mobility; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor device models; semiconductor device noise; III-V semiconductors; InAlAs-InGaAs-InP; diffusion noise; electron mobility; impedance field model; input noise resistance; minimum noise figure; noise parameter modeling; noise-optimum impedance; pseudomorphic HEMTs; scattering parameters; source resistance; unity current gain cut-off frequency; Charge carrier density; Cutoff frequency; Electron mobility; HEMTs; Impedance; Indium; Laboratories; National electric code; Noise figure; Noise reduction;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.622590
  • Filename
    622590