• DocumentCode
    1548173
  • Title

    Uses of electroplated aluminum for the development of microstructures and micromachining processes

  • Author

    Frazier, A. Bruno ; Allen, Mark G.

  • Author_Institution
    Sch. of Electr. Eng., Utah Univ., Salt Lake City, UT, USA
  • Volume
    6
  • Issue
    2
  • fYear
    1997
  • fDate
    6/1/1997 12:00:00 AM
  • Firstpage
    91
  • Lastpage
    98
  • Abstract
    In this paper, electroplated aluminum is explored as both a material for the fabrication of microstructures and use in the development of micromachining processes. A method for the fabrication of aluminum microstructures based on electrodeposition from organic solutions is presented. An extension of this process involving the use of plated aluminum structures as plating molds for subsequent electrodeposition of other materials is also discussed. Maximum structure aspect ratios of 21:1 have been demonstrated using this extended micromolding process. Finally, an aluminum-based process, in which the width of a metallic microstructure or the gap between metallic microstructures is achieved by controlling the plating time, is discussed. Using this process, vertical-gap aspect ratios between metallic microstructures of 25:1 have been demonstrated. Since the width of these features is controlled by the plating time and not by photolithography, gaps between metallic microstructures or widths of electroplated features ranging from submicron to tens of microns can be easily achieved using this process
  • Keywords
    aluminium; electrochemistry; electroplated coatings; micromachining; Al; aspect ratio; electrodeposition; electroplated aluminum; metallic microstructure fabrication; micromachining; micromolding; Aluminum; Electrodes; Electrostatics; Fabrication; Inorganic materials; Integrated circuit technology; Lithography; Micromachining; Microstructure; Rotors;
  • fLanguage
    English
  • Journal_Title
    Microelectromechanical Systems, Journal of
  • Publisher
    ieee
  • ISSN
    1057-7157
  • Type

    jour

  • DOI
    10.1109/84.585786
  • Filename
    585786