Title :
Early history of vacuum arc deposition
Author :
Boxman, Raymond L.
Author_Institution :
Fleischman Fac. of Eng., Tel Aviv Univ., Israel
fDate :
10/1/2001 12:00:00 AM
Abstract :
Vacuum arc deposition (VAD) was first investigated at the end of the 19th century by A. W. Wright and T. A. Edison, as mirror coatings and seed layers for phonogram replication molds, respectively. The early research anticipated later developments, including cathode shielding, multi-layer coatings, substrate motion, and hybrid processing
Keywords :
history; vacuum arcs; vacuum deposition; Arthur W. Wright; Thomas A. Edison; cathode shielding; duplication; high current electrical discharge; history; hybrid processing; mirror coatings; multi-layer coatings; phonogram replication molds; phonograms; seed layers; substrate´ motion; thin films; vacuum arc deposition; Cathodes; Coatings; Electrodes; Electron tubes; Glass; Helium; History; Switches; Transistors; Vacuum arcs;
Journal_Title :
Plasma Science, IEEE Transactions on
