• DocumentCode
    1549429
  • Title

    Full-wave analysis of coplanar waveguides by variational conformal mapping technique

  • Author

    Chang, Chia-Nan ; Wong, Yu-Ching ; Chen, Chun Hsiung

  • Author_Institution
    Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
  • Volume
    38
  • Issue
    9
  • fYear
    1990
  • fDate
    9/1/1990 12:00:00 AM
  • Firstpage
    1339
  • Lastpage
    1344
  • Abstract
    A new full-wave analysis of coplanar waveguides is presented. The modified mapping technique of C.P. Wen (1969) is used to map the original infinite domain into a finite image domain and also to account for the singularity of fields near the conductor edges. The finite thickness of the dielectric substrate is considered together with the assumptions of lossless guides and negligible metallization thickness. The current distributions on the center signal strip as well as the tangential electric fields over the slot along the air-dielectric interface are examined. Numerical results for the frequency-dependent effective dielectric constants and characteristic impedances of coplanar waveguides are presented. Particular attention is given to the electric field distributions over the air-dielectric interface of slots and the current distributions of the signal strip
  • Keywords
    waveguide theory; waveguides; CPW; air-dielectric interface; characteristic impedances; conductor edges; coplanar waveguides; current distributions; dielectric substrate thickness; electric field distributions; finite image domain; frequency-dependent effective dielectric constants; full-wave analysis; lossless guides; mapping technique; metallization thickness; singularity of fields; tangential electric fields; variational conformal mapping technique; Conductors; Coplanar waveguides; Current distribution; Dielectric constant; Dielectric losses; Dielectric substrates; Frequency; Impedance; Metallization; Strips;
  • fLanguage
    English
  • Journal_Title
    Microwave Theory and Techniques, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9480
  • Type

    jour

  • DOI
    10.1109/22.58662
  • Filename
    58662