DocumentCode :
1549568
Title :
Cold Cathode Sputtering in Glow Discharges
Author :
Alberts, Ian L. ; Barratt, David S. ; Ray, Asim K.
Author_Institution :
Wolfson Centre for Mater. Process., Brunel Univ., Uxbridge, UK
Volume :
8
Issue :
8
fYear :
2012
Firstpage :
450
Lastpage :
456
Abstract :
A constant challenge for industrialists in cold cathode technologies is the selection of a cathode material which exhibits suitable properties in order to improve performance. One particularly important aspect of performance is the sputter erosion of the cathode, which can lead to lamp failures. Traditionally, refractory metals have been favored for their high densities and energies of sublimation, which result in low sputter yields according to the theory due to Sigmund, and in experiment. However, this paper presents a simple theory which shows that the primary sputter yield is only one step in the liberation of sputtered material from the electrode. The energy of sublimation in fact plays an important role in the energy distribution of the sputtered material. Also, collisions in the bulk gas and the voltage characteristics of the cathode dark space should be taken into consideration for calculating the flux of liberated material. The paper presents a heuristic model of cold cathode sputtering in glow discharges with a view to elucidating the underlying physics in the process. The theory results in a reappraisal of electrode material properties that differs from the traditional view.
Keywords :
cathodes; discharge lamps; glow discharges; refractories; sputtering; sublimation; cathode dark space; cathode material; cold cathode sputtering; electrode material; energy distribution; glow discharge; heuristic model; lamp failure; refractory metal; sputter erosion; sputtered material; sublimation; Argon; Cathodes; Ions; Nickel; Sputtering; CCFL; Glow discharge; cathode erosion; cold cathode; hollow cathode effect; sputtering;
fLanguage :
English
Journal_Title :
Display Technology, Journal of
Publisher :
ieee
ISSN :
1551-319X
Type :
jour
DOI :
10.1109/JDT.2012.2198194
Filename :
6227308
Link To Document :
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