DocumentCode :
1550306
Title :
Investigation of Interfacial Reactions and Sn Whisker Formation in the Matte Sn Layer With NiP/Ni/Cu and Ni/Cu Multilayer Systems
Author :
Yen, Yee-wen ; Liou, Wei-kai ; Jao, Chien-Chung
Author_Institution :
Dept. of Mater. Sci. & Eng., Nat. Taiwan Univ. of Sci. & Technol., Taipei, Taiwan
Volume :
1
Issue :
6
fYear :
2011
fDate :
6/1/2011 12:00:00 AM
Firstpage :
951
Lastpage :
956
Abstract :
This paper investigates the relationship between the interfacial reactions and Sn whisker formation in the matte Sn layer in NiP/Ni/Cu and Ni/Cu multilayer systems. All specimens were first reflowed at 250°C for 10 min and then aged at 150°C for 500 h. Sn whiskers were found only in the Sn/Ni/Cu multilayer specimen. Ni from the NiP layer was consumed to form the Ni3Sn4 phase in the Sn/NiP/Ni/Cu specimen. Thus, the phosphorous (P) atoms segregated at the interface and reacted with Ni and Sn atoms to form the Ni-P-Sn ternary phase between the phase and NiP layer. This Ni-P-Sn ternary phase acted as a diffusion barrier and decreased the diffusion rate and diffusion flux of the Ni atoms. The compressive stress induced by the flux of the Ni atoms was the driving force resulting in Sn whisker growth. The Ni-P-Sn ternary can inhibit this compressive stress. That is why no Sn whiskers were found in the Sn/NiP/Ni/Cu multilayer specimen.
Keywords :
ageing; copper; diffusion barriers; interface phenomena; multilayers; nickel; nickel compounds; segregation; tin; whiskers (crystal); Sn-Ni-Cu; Sn-NiP-Ni-Cu; ageing; compressive stress; diffusion flux barrier; interfacial reactions; matte tin whisker formation; multilayer systems; phosphorous atoms; reflowing; segregation; temperature 150 degC; temperature 250 degC; time 10 min; time 500 h; Atomic layer deposition; Copper; Nickel; Nonhomogeneous media; Substrates; Surface morphology; Tin; Compressive stress; Sn whisker; Sn/NiP/Ni/Cu and Sn/Ni/Cu multilayer specimen; diffusion barrier; interfacial reaction;
fLanguage :
English
Journal_Title :
Components, Packaging and Manufacturing Technology, IEEE Transactions on
Publisher :
ieee
ISSN :
2156-3950
Type :
jour
DOI :
10.1109/TCPMT.2010.2102036
Filename :
5871428
Link To Document :
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