Densely arrayed eight-wavelength semiconductor lasers fabricated by microarray selective epitaxy

This paper describes a novel epitaxial growth technique, called microarray selective epitaxy (MASE), for fabricating extremely small integrated photonic devices. The MASE technique makes it possible to form densely arrayed (pitch <10 μm) multiple-quantum-well (MQW) waveguides without semiconductor etching as well as to control the bandgap energy of each waveguide. The technique is demonstrated for fabricating an eight-channel 10-μm-spacing microarray MQW structure, and the bandgap wavelength of each channel is successfully controlled by changing the SiO₂ mask pattern over a range of 90 nm. The technique is also applied to the fabrication of densely arrayed, eight-wavelength, Fabry-Perot laser diodes. The laser section is only 70 pm wide and 400 μm long. Eight different lasing wavelengths (each over 80 nm), a uniform threshold current of less than 9 mA, and an output power of over 10 mW are obtained