DocumentCode :
1550606
Title :
Automatic classification of wafer defects: status and industry needs
Author :
Shapiro, Arye
Author_Institution :
Adv. Micro Devices Inc., Austin, TX, USA
Volume :
20
Issue :
2
fYear :
1997
fDate :
4/1/1997 12:00:00 AM
Firstpage :
164
Lastpage :
167
Abstract :
This paper describes the automatic defect classification (ADC) beta site evaluations performed as part of the SEMATECH ADC project. Two optical review microscopes equipped with ADC software were independently evaluated in manufacturing environments. Both microscopes were operated in bright-field mode with white light illumination, ADC performance was measured on three process levels of random logic devices: source/drain, polysilicon gate, and metal. ADC performance metrics included classification accuracy, repeatability, and speed. In particular, ADC software was tested using a protocol that included knowledge base tests, gauge studies, and small passive data collections
Keywords :
automatic optical inspection; computerised instrumentation; integrated circuit manufacture; optical microscopy; pattern classification; production testing; SEMATECH ADC project; automatic classification; automatic defect classification software; beta site evaluations; bright-field mode; classification accuracy; gauge studies; knowledge base tests; manufacturing environment; optical review microscopes; repeatability; small passive data collections; wafer defects; white light illumination; High speed optical techniques; Inspection; Logic devices; Manufacturing industries; Measurement; Optical microscopy; Optical sensors; Performance evaluation; Scanning electron microscopy; Software testing;
fLanguage :
English
Journal_Title :
Components, Packaging, and Manufacturing Technology, Part C, IEEE Transactions on
Publisher :
ieee
ISSN :
1083-4400
Type :
jour
DOI :
10.1109/3476.622886
Filename :
622886
Link To Document :
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