• DocumentCode
    155074
  • Title

    The surface structuring crystals of silicon (100) after the microwave of plasmochemical etching in freon-14

  • Author

    Yafarov, R.K. ; Shanygin, V.Ya.

  • Author_Institution
    Saratov Branch, Kotel´nikov Inst. of Radio Eng. & Electron., Saratov, Russia
  • Volume
    2
  • fYear
    2014
  • fDate
    25-26 Sept. 2014
  • Firstpage
    381
  • Lastpage
    387
  • Abstract
    In this work the kinetics of transformation of the surface structure of plates of silicon of crystallographic orientation (100) various types of conduction after the low energy microwave of plasmochemical etching in the environment of freon was studied.
  • Keywords
    elemental semiconductors; etching; microwave materials processing; plasma chemistry; silicon; surface phase transformations; Si; freon-14 microwave plasmochemical etching; silicon (100) crystallographic orientation; surface structuring; transformation kinetics; Crystals; Educational institutions; Electronic mail; Etching; Kinetic theory; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Actual Problems of Electron Devices Engineering (APEDE), 2014 International Conference on
  • Conference_Location
    Saratov
  • Print_ISBN
    978-1-4799-3437-9
  • Type

    conf

  • DOI
    10.1109/APEDE.2014.6958282
  • Filename
    6958282
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=155074