Title :
The surface structuring crystals of silicon (100) after the microwave of plasmochemical etching in freon-14
Author :
Yafarov, R.K. ; Shanygin, V.Ya.
Author_Institution :
Saratov Branch, Kotel´nikov Inst. of Radio Eng. & Electron., Saratov, Russia
Abstract :
In this work the kinetics of transformation of the surface structure of plates of silicon of crystallographic orientation (100) various types of conduction after the low energy microwave of plasmochemical etching in the environment of freon was studied.
Keywords :
elemental semiconductors; etching; microwave materials processing; plasma chemistry; silicon; surface phase transformations; Si; freon-14 microwave plasmochemical etching; silicon (100) crystallographic orientation; surface structuring; transformation kinetics; Crystals; Educational institutions; Electronic mail; Etching; Kinetic theory; Silicon;
Conference_Titel :
Actual Problems of Electron Devices Engineering (APEDE), 2014 International Conference on
Conference_Location :
Saratov
Print_ISBN :
978-1-4799-3437-9
DOI :
10.1109/APEDE.2014.6958282
