Quasi-static analysis of coupled microstrip lines with asymmetrical finite metallization thickness

Author

Hong, Ic-Pyo ; Park, Seong-Kyoon ; Park, Han-Kyu

Author_Institution

Dept. of Radio Commun. Eng., Yonsei Univ., Seoul, South Korea

Volume

47

Issue

9

fYear

1999

fDate

9/1/1999 12:00:00 AM

Firstpage

1739

Lastpage

1742

Abstract

This paper describes the quasi-static analysis of coupled microstrip lines with asymmetrical finite metallization thickness. A generalized mode-matching method extended from the conventional mode-matching method has been used to analyze the inhomogeneous structure with arbitrary metallization thickness and is validated through comparison with those from other available results. This method cannot only provide a simple approach to the quasi-static analysis of the inhomogeneous structures with arbitrary metallization thickness, but can also be applied to analyze the effect of metal penetration depth into the substrate. The results show that the asymmetrical finite metallization thickness and metal penetration depth into the substrate can be newly added to the quasi-static design parameters of coupled microstrip lines

Keywords

MMIC; coupled transmission lines; integrated circuit metallisation; microstrip lines; mode matching; transmission line theory; arbitrary metallization thickness; asymmetrical finite metallization thickness; coupled microstrip lines; generalized mode-matching method; inhomogeneous structure; metal penetration depth; quasi-static analysis; quasi-static design parameters; substrate penetration; Coordinate measuring machines; Coupling circuits; Eigenvalues and eigenfunctions; Frequency; Metallization; Microstrip; Microwave propagation; Mode matching methods; Planar transmission lines; Radio communication;

fLanguage

English

Journal_Title

Microwave Theory and Techniques, IEEE Transactions on

Publisher

ieee

ISSN

0018-9480

Type

jour

DOI

10.1109/22.788617

Filename

788617