DocumentCode
1551764
Title
Dynamic Study of Dual High-Power Impulse Magnetron Sputtering Discharge by Optical Emission Imaging
Author
Stranak, V. ; Bogdanowicz, R. ; Drache, S. ; Cada, M. ; Hubicka, Z. ; Hippler, R.
Author_Institution
Univ. of Greifswald, Greifswald, Germany
Volume
39
Issue
11
fYear
2011
Firstpage
2454
Lastpage
2455
Abstract
Fast optical emission imaging was employed for dynamic study of dual-high-power impulse magnetron sputtering discharge. The sputtering sources were equipped with reversed polarity of magnets, i.e., so-called closed magnetic field between magnetrons. Plasma is confined in closed magnetic field between targets alternately employed as cathode/anode. This type of magnetic confinement affects the transport of electrons and also the ionization processes of neutral particles present in the plasma, as will be shown in this paper.
Keywords
anodes; cathodes; discharges (electric); ionisation; plasma confinement; plasma diagnostics; plasma sources; plasma transport processes; sputtering; closed magnetic field; dual high power impulse magnetron sputtering discharge; electron transport; fast optical emission imaging; magnetic confinement; neutral particle ionization processes; plasma anode; plasma cathode; reversed polarity magnets; sputtering sources; Copper; Discharges; Ions; Magnetic resonance imaging; Optical imaging; Plasmas; Sputtering; Magnetic confinement; plasma properties; plasma sources;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2011.2155674
Filename
5872064
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