DocumentCode :
1551764
Title :
Dynamic Study of Dual High-Power Impulse Magnetron Sputtering Discharge by Optical Emission Imaging
Author :
Stranak, V. ; Bogdanowicz, R. ; Drache, S. ; Cada, M. ; Hubicka, Z. ; Hippler, R.
Author_Institution :
Univ. of Greifswald, Greifswald, Germany
Volume :
39
Issue :
11
fYear :
2011
Firstpage :
2454
Lastpage :
2455
Abstract :
Fast optical emission imaging was employed for dynamic study of dual-high-power impulse magnetron sputtering discharge. The sputtering sources were equipped with reversed polarity of magnets, i.e., so-called closed magnetic field between magnetrons. Plasma is confined in closed magnetic field between targets alternately employed as cathode/anode. This type of magnetic confinement affects the transport of electrons and also the ionization processes of neutral particles present in the plasma, as will be shown in this paper.
Keywords :
anodes; cathodes; discharges (electric); ionisation; plasma confinement; plasma diagnostics; plasma sources; plasma transport processes; sputtering; closed magnetic field; dual high power impulse magnetron sputtering discharge; electron transport; fast optical emission imaging; magnetic confinement; neutral particle ionization processes; plasma anode; plasma cathode; reversed polarity magnets; sputtering sources; Copper; Discharges; Ions; Magnetic resonance imaging; Optical imaging; Plasmas; Sputtering; Magnetic confinement; plasma properties; plasma sources;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2011.2155674
Filename :
5872064
Link To Document :
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