• DocumentCode
    1551764
  • Title

    Dynamic Study of Dual High-Power Impulse Magnetron Sputtering Discharge by Optical Emission Imaging

  • Author

    Stranak, V. ; Bogdanowicz, R. ; Drache, S. ; Cada, M. ; Hubicka, Z. ; Hippler, R.

  • Author_Institution
    Univ. of Greifswald, Greifswald, Germany
  • Volume
    39
  • Issue
    11
  • fYear
    2011
  • Firstpage
    2454
  • Lastpage
    2455
  • Abstract
    Fast optical emission imaging was employed for dynamic study of dual-high-power impulse magnetron sputtering discharge. The sputtering sources were equipped with reversed polarity of magnets, i.e., so-called closed magnetic field between magnetrons. Plasma is confined in closed magnetic field between targets alternately employed as cathode/anode. This type of magnetic confinement affects the transport of electrons and also the ionization processes of neutral particles present in the plasma, as will be shown in this paper.
  • Keywords
    anodes; cathodes; discharges (electric); ionisation; plasma confinement; plasma diagnostics; plasma sources; plasma transport processes; sputtering; closed magnetic field; dual high power impulse magnetron sputtering discharge; electron transport; fast optical emission imaging; magnetic confinement; neutral particle ionization processes; plasma anode; plasma cathode; reversed polarity magnets; sputtering sources; Copper; Discharges; Ions; Magnetic resonance imaging; Optical imaging; Plasmas; Sputtering; Magnetic confinement; plasma properties; plasma sources;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2011.2155674
  • Filename
    5872064