Title :
Three-Dimensional Photoacoustic Imaging by a CMOS Micromachined Capacitive Ultrasonic Sensor
Author :
Li, Meng-Lin ; Wang, Po-Hsun ; Liao, Pei-Liang ; Lu, Michael S -C
Author_Institution :
Dept. of Electr. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Abstract :
In this letter, we demonstrate the feasibility of 3-D photoacoustic imaging using a monolithic CMOS micromachined capacitive ultrasonic sensor. The sensing membranes are released by a post-CMOS metal etch and sealed by silicon dioxide. Nine membranes, each with an inner diameter of 60 μm, form a single detection unit with a capacitance value of 292.5 fF. A 6- μm carbon fiber was employed to evaluate the 3-D photoacoustic imaging capability and resolution of our sensor. A 2-D large-aperture array was emulated by 2-D mechanical scanning of a single sensing element with a scanning step of 120 μm. A 2-D synthetic aperture focusing technique was used for image reconstruction. The measured -6-dB spatial resolutions were 181 μm in axial and 448 μm in lateral, respectively, at the depth of ~ 2.4 cm. The 3-D photoacoustic image of a carbon fiber phantom was successfully produced.
Keywords :
CMOS image sensors; capacitive sensors; carbon fibres; image reconstruction; micromachining; microsensors; phantoms; ultrasonic devices; ultrasonic focusing; ultrasonic imaging; 2d large aperture array; 2d mechanical scanning; 2d synthetic aperture focusing; 3d photoacoustic imaging; capacitance 292.5 fF; carbon fiber phantom; image reconstruction; micromachined capacitive sensor; monolithic CMOS technology; size 120 mum; size 181 mum; size 6 mum; size 60 mum; ultrasonic sensor; Acoustics; Arrays; CMOS integrated circuits; Carbon; Image resolution; Imaging; Sensors; CMOS technology; Capacitive sensors; microelectromechanical systems (MEMS); photoacoustic imaging;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2011.2157655