• DocumentCode
    1552615
  • Title

    Improving the quality of schottky contacts on zno microwires using Cu-contained silver paste electrode

  • Author

    Yu Qiu ; Heqiu Zhang ; Lizhong Hu ; Lina Wang ; Bin Wang ; Dechao Yang ; Guoqiang Liu ; Jiuyu Ji ; Xin Liu ; Jianfang Lin ; Ye Lang ; Fei Li ; Shijun Han

  • Author_Institution
    Sch. of Phys. & Optoelectron. Technol., Dalian Univ. of Technol., Dalian, China
  • Volume
    7
  • Issue
    6
  • fYear
    2012
  • fDate
    6/1/2012 12:00:00 AM
  • Firstpage
    592
  • Lastpage
    595
  • Abstract
    High-quality Schottky devices based on ZnO microwires (MWs) by using a simple and effective method are reported. Cu-contained silver paste (SPC) was used as the contact electrodes of one end of ZnO MW-based metal-semiconductor-metal structures instead of the conventional method, in which customised silver paste was used as the contact electrodes of both ends of the structure. The experimental results reveal that SPC used in this study can increase the opportunity for obtaining the device with rectifying behaviour. The best-produced device exhibited a very high rectifying ratio of 105 at ±1±V. In addition, the rectifying I-V characteristics were greatly improved after annealing treatment because of the elimination of the bubbles in the conductive pastes. Moreover, the influence of contact area on the electrical properties was also investigated. It was shown that the contact area between ZnO MW and the electrode also played an important role in determining the rectifying performance.
  • Keywords
    II-VI semiconductors; Schottky barriers; copper; metal-semiconductor-metal structures; silver; wide band gap semiconductors; zinc compounds; Cu-contained silver paste electrode; SPC; Schottky contacts quality; ZnO; ZnO MW-based metal-semiconductor-metal structures; ZnO microwires; annealing treatment; bubble elimination; conductive pastes; contact area; contact electrodes; electrical properties; rectifying I-V characteristics; rectifying performance; rectifying ratio;
  • fLanguage
    English
  • Journal_Title
    Micro & Nano Letters, IET
  • Publisher
    iet
  • ISSN
    1750-0443
  • Type

    jour

  • DOI
    10.1049/mnl.2012.0269
  • Filename
    6231265