DocumentCode
1552961
Title
Design Optimization of Pulsed-Mode Electromechanical Nonvolatile Memory
Author
Pott, Vincent ; Vaddi, Ramesh ; Chua, Geng Li ; Lin, Julius Tsai Ming ; Kim, Tony T.
Author_Institution
Inst. of Microelectron., Agency for Sci., Technol. & Res. (A*STAR), Singapore, Singapore
Volume
33
Issue
8
fYear
2012
Firstpage
1207
Lastpage
1209
Abstract
Storage-layer-based nonvolatile memory (NVM) devices, such as Flash, ferroelectric RAM, or magnetic RAM, have limited reliability at high temperature (HT, T >; 200°C). On the contrary, storage-layer-free NVM devices based on a bistable nanoelectromechanical (NEM) mechanism and adhesion forces show excellent reliability at HT. This letter presents design optimization of an electrostatic NEM NVM device. The set/ reset principle is based on the pulsed-mode switching of a mechanically free electrode (the shuttle), which is placed inside a guiding pod, having two stable positions. Based on the shuttle kinematic equation, this letter derives key design and operation parameters, particularly optimization in terms of switching speed and switching energy. The small footprint of the shuttle NEM NVM makes it applicable to ultracompact and reliable data storage at HT.
Keywords
high-temperature electronics; integrated circuit reliability; nanoelectromechanical devices; random-access storage; adhesion forces; bistable nanoelectromechanical mechanism; design optimization; ferroelectric RAM; magnetic RAM; mechanically free electrode; pulsed-mode electromechanical nonvolatile memory; set/ reset principle; storage-layer-based nonvolatile memory; storage-layer-free NVM devices; Adhesives; Electrodes; Geometry; Logic gates; Nonvolatile memory; Reliability; Switches; High-temperature (HT) electronics; nanoelectromechanical (NEM) systems; nonvolatile memory (NVM);
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2012.2201440
Filename
6231644
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