Time-dependent degradation law for reliable lifetime prediction in sub-0.25 μm bulk silicon N-MOSFETs

The hot-carrier-induced degradation of sub-0.25 μm bulk Si MOSFETs is studied. A new degradation law is proposed and compared to the main existing models. This comparison shows that the new model gives more accurate results. Using this degradation law, the maximum drain voltage for a 10% transconductance degradation after 10 years has been extracted. A reduced V_dmax as compared to the values given by the previous laws, which overestimate V_dmax for deep submicrometre devices, is determined