DocumentCode
1553783
Title
Laser Wavelength Choices for Pico-Projector Applications
Author
Buckley, Edward
Author_Institution
Pixtronix, Inc., Andover, MA, USA
Volume
7
Issue
7
fYear
2011
fDate
7/1/2011 12:00:00 AM
Firstpage
402
Lastpage
406
Abstract
The rapid progress in laser light source development, particularly in the gallium-nitride material system, means that a wide range of wavelengths are now available for pico-projection applications intended to deliver 20 lm or less. In principle, this affords designers of pico-projection systems great flexibility in choosing laser wavelengths to optimize specific performance metrics. With the proliferation of laser-based pico-projectors, however, it has become clear that current laser safety regulations and their wavelength-dependent classification criteria play a fundamental role in determining the brightness roadmaps of scanned-beam and liquid crystal on silicon (LCoS) pico-projection systems. In this paper, it is shown that it is possible to choose laser wavelengths to simultaneously maximize eye-safe luminous flux and color gamut, but that the resultant values are significantly different for Class 2 and Class 1 eye-safe projection systems.
Keywords
laser beam applications; light sources; liquid crystal on silicon; color gamut; eye-safe luminous flux; gallium-nitride material system; laser safety regulations; laser wavelength; liquid crystal on silicon; performance metrics; pico-projector applications; scanned-beam; wavelength-dependent classification; wavelength-dependent classification criteria; Color; Diode lasers; Laser applications; Radiometry; Safety; Semiconductor lasers; Display human factors; displays; lasers;
fLanguage
English
Journal_Title
Display Technology, Journal of
Publisher
ieee
ISSN
1551-319X
Type
jour
DOI
10.1109/JDT.2011.2125944
Filename
5876040
Link To Document