DocumentCode :
1553877
Title :
Accurate wavelength spacing from absorption-coupled DFB laser arrays
Author :
Talneau, A. ; Bouadma, N. ; Slempkes, S. ; Ougazzaden, A. ; Hansmann, S.
Author_Institution :
CNET, Bagneux, France
Volume :
9
Issue :
10
fYear :
1997
Firstpage :
1316
Lastpage :
1318
Abstract :
Six-element absorption-coupled distributed-feedback (DFB) arrays have been fabricated by means of holographic lithography. Using a simple current injection scheme in two-section devices, a standard deviation of 0.11 nm from a uniform wavelength channel spacing of 2 nm has been achieved. This value is easily obtained using standard lithography technologies for fabrication, and coarse current control for operation. It allows the use of complex-coupled DPB lasers as sources in photonic integrated circuits.
Keywords :
distributed feedback lasers; electron beam lithography; holographic gratings; integrated optics; light absorption; optical fabrication; quantum well lasers; semiconductor laser arrays; GaInAsP; absorption-coupled DFB laser arrays; accurate wavelength spacing; coarse current control; complex-coupled DPB lasers; electron beam lithography; fabrication; holographic grating technology; holographic lithography; operation; photonic integrated circuits; simple current injection; six-element absorption-coupled distributed-feedback arrays; sources; two-section devices; uniform wavelength channel spacing; Distributed feedback devices; Etching; Gratings; Holography; Indium phosphide; Lithography; Optical arrays; Resists; Semiconductor laser arrays; Surface emitting lasers;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/68.623248
Filename :
623248
Link To Document :
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