Demonstration of Distributed Etched Diffraction Grating Demultiplexer

Author

Jafari, Amir ; Kirk, Andrew G.

Author_Institution

Dept. of Electr. & Comput. Eng., McGill Univ., Montreal, QC, Canada

Volume

3

Issue

4

fYear

2011

Firstpage

651

Lastpage

657

Abstract

The design principles and measurement results for a compact shallow etched distributed diffraction grating waveguide demultiplexer are presented. The deeply etched diffraction grating facets are replaced with a shallow etched odd-order quarter wavelength Bragg reflector to increase the Fresnel reflection coefficient. A prototype device was designed for coarse wavelength demultiplexing applications and was fabricated in nanophotonic silicon-on-insulator platform using deep ultraviolet (DUV) optical lithography. The demultiplexer, which supports four channels with 20-nm channel spacing, shows a crosstalk of -25 dB.

Keywords

channel spacing; demultiplexing equipment; diffraction gratings; integrated optics; nanophotonics; optical communication equipment; optical crosstalk; optical design techniques; optical fabrication; optical waveguides; reflectivity; silicon-on-insulator; ultraviolet lithography; wavelength division multiplexing; Fresnel reflection coefficient; Si; channel spacing; coarse wavelength demultiplexing applications; compact shallow distributed etched diffraction grating waveguide demultiplexer; deep ultraviolet optical lithography; nanophotonic silicon-on-insulator platform; optical crosstalk; shallow etched odd-order quarter wavelength Bragg reflector; Arrayed waveguide gratings; Bragg gratings; Diffraction; Diffraction gratings; Distributed Bragg reflectors; Insertion loss; Distributed Bragg reflector (DBR); etched diffraction grating demultiplexer; waveguide devices;

fLanguage

English

Journal_Title

Photonics Journal, IEEE

Publisher

ieee

ISSN

1943-0655

Type

jour

DOI

10.1109/JPHOT.2011.2159582

Filename

5876294