Title :
Operation of SiGe heterojunction bipolar transistors in the liquid-helium temperature regime
Author :
Joseph, A.J. ; Cressler, J.D. ; Richey, D.M.
Author_Institution :
Alabama Microelectron. Sci. & Technol. Center, Auburn Univ., AL, USA
fDate :
6/1/1995 12:00:00 AM
Abstract :
We present the first dc measurements of silicon-germanium (SiGe) heterojunction bipolar transistors (HBTs) operating in the liquid-helium temperature (LHeT=4.2 K) regime. The current gain of the self-aligned, UHV/CVD-grown SiGe HBT increases monotonically from 110 at 300 K to 1045 at 5.84 K, although parasitic base current leakage limits the useful operating current to above about 1.0 μA at 5.84 K. An aggressively designed base profile (peak N/sub AB//spl ap/8×10/sup 18/ cm/sup -3/) is used to suppress base freeze-out at LHeT (R/sub bi/=18.3 k/spl Omega///spl square/ at 4.48 K). We have also identified a non-ideal minority carrier transport mechanism in the collector current at temperatures below 77 K (I/sub C/ is not proportional to exp(qV/sub BE//kT)) which is unaccounted for in conventional device theory. Preliminary calculations suggest that this phenomenon is due to trap-assisted carrier tunneling from the emitter to the collector through the base potential barrier.
Keywords :
Ge-Si alloys; 4.2 K; SiGe; base freeze-out; base potential barrier; base profile; collector current; current gain; heterojunction bipolar transistors; liquid-helium temperature regime; nonideal minority carrier transport mechanism; parasitic base current leakage; self-aligned transistor; trap-assisted carrier tunneling; useful operating current; Bipolar transistors; Cryogenics; Frequency; Germanium silicon alloys; Heterojunction bipolar transistors; Nitrogen; Silicon germanium; Space technology; Temperature distribution; Tunneling;
Journal_Title :
Electron Device Letters, IEEE