• DocumentCode
    1554565
  • Title

    Photonic crystal polarisation splitters

  • Author

    Ohtera, Y. ; Sato, T. ; Kawashima, T. ; Tamamura, T. ; Kawakami, S.

  • Author_Institution
    Res. Inst. of Electr. Commun., Tohoku Univ., Sendai, Japan
  • Volume
    35
  • Issue
    15
  • fYear
    1999
  • fDate
    7/22/1999 12:00:00 AM
  • Firstpage
    1271
  • Lastpage
    1272
  • Abstract
    The design, fabrication, and measurement of an a-Si/SiO2 photonic crystal polarisation splitter are reported. The device consists of a 10-period corrugated multilayer film and is made by a combination of sputter-deposition and sputter-etching processes. The measured insertion loss and extinction ratio at λ=1.55 μm are 0.4 dB and >40 dB, respectively
  • Keywords
    light polarisation; optical beam splitters; optical communication equipment; optical fabrication; optical multilayers; optical testing; photonic band gap; silicon; silicon compounds; sputter deposition; sputter etching; sputtered coatings; 1.55 mum; Si-SiO2; a-Si/SiO2 photonic crystal polarisation splitter; corrugated multilayer film; design; extinction ratio; fabrication; insertion loss; measurement; sputter-deposition; sputter-etching;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19990875
  • Filename
    790793
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1554565