DocumentCode :
1555120
Title :
15 GHz fmax microwave silicon p-n- rho transistors with single-crystal emitters fabricated with simple four mask process
Author :
Hebert, Francois ; Wholey, J. ; Snapp, C. ; Garcia, Alvaro
Author_Institution :
Adv. Bipolar Products, AV ANTEK Inc., Newark, CA, USA
Volume :
27
Issue :
20
fYear :
1991
Firstpage :
1886
Lastpage :
1888
Abstract :
Vertical p-n- rho transistors have been fabricated using a four mask, low cost quasi-selfaligned process with submicrometre feature sizes. The resulting monocrystalline emitter devices achieve ft greater than 9 GHz and fmax greater than 15 GHz with BVceo greater than 13 V. These discrete p-n- rho ´s were used successfully as active loads for a monolithic n- rho -n opamp to achieve a gain-bandwidth product of 4.4 GHz.
Keywords :
bipolar transistors; elemental semiconductors; silicon; solid-state microwave devices; 15 GHz; SHF; active loads; four mask process; microwave transistors; monocrystalline emitter devices; p-n- rho transistors; quasi-selfaligned process; single-crystal emitters; submicrometre feature sizes; vertical p-n- rho transistors;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19911169
Filename :
97235
Link To Document :
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