• DocumentCode
    1555237
  • Title

    High-index overlay for high reflectance DBR gratings in LiNbO3 channel waveguides

  • Author

    Hussell, C.P. ; Ramaswamy, R.V.

  • Author_Institution
    Uniphase Telecomun. Products, Bloomfield, CT, USA
  • Volume
    9
  • Issue
    5
  • fYear
    1997
  • fDate
    5/1/1997 12:00:00 AM
  • Firstpage
    636
  • Lastpage
    638
  • Abstract
    A thin overlay of high refractive index material is used to obtain high reflectance DBR waveguides in lithium niobate. Silicon, deposited by e-beam evaporation, is found to be a suitable material for this purpose because of its high refractive index, transparency to 1.3- and 1.5-μm wavelengths, opacity to the visible spectrum, and ease of etching. Experimental results match the theory extremely well and, to the best of our knowledge, exhibit the highest reflection per unit length from a lithium niobate corrugated waveguide reported to date on on insulator technology, waveguide filters.
  • Keywords
    diffraction gratings; distributed feedback lasers; integrated optics; lithium compounds; optical waveguides; reflectivity; refractive index; transparency; vapour deposition; waveguide lasers; 1.3 mum; 1.5 mum; LiNbO/sub 3/; LiNbO/sub 3/ channel waveguides; e-beam evaporation; etching; high reflectance DBR gratings; high reflectance DBR waveguides; high refractive index; high refractive index material; high-index overlay; highest reflection; insulator technology; lithium niobate; lithium niobate corrugated waveguide; opacity; transparency; visible spectrum; waveguide filters; Distributed Bragg reflectors; Etching; Gratings; Insulation; Lithium niobate; Reflection; Reflectivity; Refractive index; Silicon; Waveguide theory;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/68.588170
  • Filename
    588170