Title :
Fabrication of low loss, waveguide grating filters using electron beam lithography
Author :
Millar, P. ; Harkins, R. ; Aitchison, J.S.
Author_Institution :
Dept. of Electron. & Electr. Eng., Glasgow Univ.
fDate :
6/5/1997 12:00:00 AM
Abstract :
A single step, electron beam writing process for the fabrication of low loss grating filters on AlGaAs rib waveguides is described. The technique allows both waveguide and grating to be defined in a single processing step. Linear loss measurements are presented which show that the presence of the grating has no significant effect on the throughput of the waveguides
Keywords :
III-V semiconductors; aluminium compounds; diffraction gratings; electron beam lithography; gallium arsenide; integrated optics; interference filters; optical fabrication; optical waveguide filters; optical waveguides; rib waveguides; AlGaAs; AlGaAs rib waveguides; electron beam lithography; fabrication; low loss grating filters; single step EB writing process; waveguide grating filters;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19970712
