DocumentCode :
1555768
Title :
Property analysis of planar optical waveguide in NYAB formed by He + ion implantation
Author :
Fei Lu ; Ke-Ming Wang ; Feng-Xiang Wang ; Wei Li ; Qing-ming Lu
Volume :
33
Issue :
12
fYear :
1997
fDate :
6/5/1997 12:00:00 AM
Firstpage :
1045
Lastpage :
1047
Abstract :
The authors report the first ion implanted planar optical waveguide in the nonlinear and multifunctional crystal NdxY 1-xAl3(BO3)4 (NYAB). The refractive index profiles are characterised for both nn and n e. The index changes show that a typical barrier waveguide is formed in the implanted NYAB crystal and comparisons of the refractive index profiles before and after annealing are given. The damage in the crystal surface that was caused by the implantation of MeV He ions was investigated by using an RBS/channelling technique and there was some decrease in the damage of the surface of the crystal after annealing. The loss of the waveguide was measured before and after annealing
Keywords :
Rutherford backscattering; aluminium compounds; annealing; channelling; ion implantation; neodymium compounds; optical fabrication; optical losses; optical planar waveguides; refractive index; yttrium compounds; He; He+ ion implantation; NYAB; NdxY1-xAl3(BO3)4 ; NdYAl3(BO3)4; RBS; annealing; barrier waveguide; channelling; loss; nonlinear crystal; planar optical waveguide; refractive index profile; surface damage;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19970693
Filename :
588429
Link To Document :
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