• DocumentCode
    1555877
  • Title

    Use of porous silicon antireflection coating in multicrystalline silicon solar cell processing

  • Author

    Bilyalov, Renat R. ; Stalmans, Lieven ; Schirone, Luigi ; Lévy-Clément, Claude

  • Author_Institution
    Fraunhofer Inst. fur Solare Energiesyst., Freiburg, Germany
  • Volume
    46
  • Issue
    10
  • fYear
    1999
  • fDate
    10/1/1999 12:00:00 AM
  • Firstpage
    2035
  • Lastpage
    2040
  • Abstract
    The latest results on the use of porous silicon (PS) as an antireflection coating (ARC) in simplified processing for multicrystalline silicon solar cells are presented. The optimization of a PS selective emitter formation results in a 14.1% efficiency multicrystalline (5×5 cm2) Si cell with evaporated contacts processed without texturization, surface passivation, or additional ARC deposition. Specific attention is given to the implementation of a PS ARC into an industrially compatible screen-printed solar cell process. Both the chemical and electrochemical PS ARC formation method are used in different solar cell processes, as well as on different multicrystalline silicon materials. Efficiencies between 12.1 and 13.2% are achieved on large-area (up to 164 cm2 ) commercial Si solar cells
  • Keywords
    antireflection coatings; elemental semiconductors; porous semiconductors; silicon; solar cells; 14.1 percent; Si; chemical method; electrochemical method; multicrystalline silicon solar cell; porous silicon antireflection coating; screen printing; selective emitter; Chemical industry; Chemical processes; Coatings; Crystallization; Degradation; Etching; Hafnium; Photovoltaic cells; Polymer films; Silicon;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.791993
  • Filename
    791993