DocumentCode :
1555877
Title :
Use of porous silicon antireflection coating in multicrystalline silicon solar cell processing
Author :
Bilyalov, Renat R. ; Stalmans, Lieven ; Schirone, Luigi ; Lévy-Clément, Claude
Author_Institution :
Fraunhofer Inst. fur Solare Energiesyst., Freiburg, Germany
Volume :
46
Issue :
10
fYear :
1999
fDate :
10/1/1999 12:00:00 AM
Firstpage :
2035
Lastpage :
2040
Abstract :
The latest results on the use of porous silicon (PS) as an antireflection coating (ARC) in simplified processing for multicrystalline silicon solar cells are presented. The optimization of a PS selective emitter formation results in a 14.1% efficiency multicrystalline (5×5 cm2) Si cell with evaporated contacts processed without texturization, surface passivation, or additional ARC deposition. Specific attention is given to the implementation of a PS ARC into an industrially compatible screen-printed solar cell process. Both the chemical and electrochemical PS ARC formation method are used in different solar cell processes, as well as on different multicrystalline silicon materials. Efficiencies between 12.1 and 13.2% are achieved on large-area (up to 164 cm2 ) commercial Si solar cells
Keywords :
antireflection coatings; elemental semiconductors; porous semiconductors; silicon; solar cells; 14.1 percent; Si; chemical method; electrochemical method; multicrystalline silicon solar cell; porous silicon antireflection coating; screen printing; selective emitter; Chemical industry; Chemical processes; Coatings; Crystallization; Degradation; Etching; Hafnium; Photovoltaic cells; Polymer films; Silicon;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.791993
Filename :
791993
Link To Document :
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