Title :
Low-loss, compact, and polarization independent PHASAR demultiplexer fabricated by using a double-etch process
Author :
den Besten, J.H. ; Dessens, M.P. ; Herben, C.G.P. ; Leijtens, X.J.M. ; Groen, F.H. ; Leys, M.R. ; Smit, M.K.
Author_Institution :
Fac. of Inf. Technol. & Syst., Delft Univ. of Technol., Netherlands
Abstract :
A compact low-loss polarization independent 8 /spl times/ 8 PHASAR demultiplexer is presented. Device size is 0.93 /spl times/ 0.75 mm/sup 2/. On-chip losses are less than 4 dB and crosstalk is better than -20 dB. The device is suitable for integration with electro-optical switches for application in integrated optical crossconnects, add-drop multiplexers and multiwavelength lasers.
Keywords :
demultiplexing equipment; electro-optical switches; integrated optics; integrated optoelectronics; optical crosstalk; optical fabrication; optical interconnections; optical losses; sputter etching; wavelength division multiplexing; 4 dB; InGaAsP; InGaAsP waveguide layer; add-drop multiplexers; compact low-loss polarization independent 8 /spl times/ 8 PHASAR demultiplexer; crosstalk; double-etch process fabrication; electro-optical switches; integrated optical crossconnects; multiwavelength lasers; on-chip losses; phased-array demultiplexers; semiconductor waveguides; wavelength-division multiplexing; Etching; Geometry; Integrated optics; Lasers and electrooptics; Optical crosstalk; Optical switches; Optical waveguides; Polarization; Semiconductor lasers; Waveguide lasers;
Journal_Title :
Photonics Technology Letters, IEEE
