Title :
High-average-power femtosecond KrF excimer laser
Author :
Nabekawa, Yasuo ; Yoshitomi, Dai ; Sekikawa, Taro ; Watanabe, Shuntaro
Author_Institution :
RIKEN, Inst. of Phys. & Chem. Res., Saitama, Japan
Abstract :
Development of high-peak and high-average-power ultrashort pulse KrF excimer lasers is described. Technical issues of KrF excimer as the amplifying medium for the ultrashort pulses are dramatically improved, resulting in a 50 W average power with a pulse width of 480 fs at 200 Hz repetition rate
Keywords :
excimer lasers; krypton compounds; optical pulse generation; 200 Hz; 480 fs; 50 W; KrF; KrF excimer amplifying medium; KrF excimer laser; average power; high-average-power KrF excimer lasers; pulse width; repetition rate; ultrafast lasers; ultrashort pulse KrF excimer lasers; ultrashort pulses; Chromium; Laser excitation; Laser mode locking; Laser theory; Optical pulse generation; Optical pulses; Power generation; Pulse amplifiers; Pump lasers; Solid lasers;
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
DOI :
10.1109/2944.974226
